WO2011021140A3 - Vertical cavity surface emitting laser array device with configurable intensity distribution - Google Patents

Vertical cavity surface emitting laser array device with configurable intensity distribution Download PDF

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Publication number
WO2011021140A3
WO2011021140A3 PCT/IB2010/053687 IB2010053687W WO2011021140A3 WO 2011021140 A3 WO2011021140 A3 WO 2011021140A3 IB 2010053687 W IB2010053687 W IB 2010053687W WO 2011021140 A3 WO2011021140 A3 WO 2011021140A3
Authority
WO
WIPO (PCT)
Prior art keywords
intensity distribution
vcsels
emitting laser
surface emitting
cavity surface
Prior art date
Application number
PCT/IB2010/053687
Other languages
French (fr)
Other versions
WO2011021140A8 (en
WO2011021140A2 (en
Inventor
Stephan Gronenborn
Holger Moench
Original Assignee
Koninklijke Philips Electronics N.V.
Philips Intellectual Property & Standards Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics N.V., Philips Intellectual Property & Standards Gmbh filed Critical Koninklijke Philips Electronics N.V.
Priority to EP10752427.4A priority Critical patent/EP2478602B1/en
Priority to KR1020127007045A priority patent/KR101733422B1/en
Priority to JP2012525239A priority patent/JP5894529B2/en
Priority to US13/391,303 priority patent/US9048633B2/en
Priority to CN201080036805.1A priority patent/CN102742100B/en
Publication of WO2011021140A2 publication Critical patent/WO2011021140A2/en
Publication of WO2011021140A8 publication Critical patent/WO2011021140A8/en
Publication of WO2011021140A3 publication Critical patent/WO2011021140A3/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/40Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42Arrays of surface emitting lasers
    • H01S5/423Arrays of surface emitting lasers having a vertical cavity
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/40Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4012Beam combining, e.g. by the use of fibres, gratings, polarisers, prisms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • B23K26/0608Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams in the same heat affected zone [HAZ]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073Shaping the laser spot
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/447Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources
    • B41J2/45Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources using light-emitting diode [LED] or laser arrays
    • B41J2/451Special optical means therefor, e.g. lenses, mirrors, focusing means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/026Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
    • H01S5/0267Integrated focusing lens
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S2301/00Functional characteristics
    • H01S2301/18Semiconductor lasers with special structural design for influencing the near- or far-field
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/0206Substrates, e.g. growth, shape, material, removal or bonding
    • H01S5/0207Substrates having a special shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/022Mountings; Housings
    • H01S5/0225Out-coupling of light
    • H01S5/02253Out-coupling of light using lenses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/06233Controlling other output parameters than intensity or frequency
    • H01S5/0624Controlling other output parameters than intensity or frequency controlling the near- or far field

Abstract

The present invention relates to a laser device comprising an array of several large area VCSELs (101) and one or several optics (201, 202) designed and arranged to image the active layers of the VCSELs (101) of said array to a working plane (501) such that the laser radiation emitted by the active layers of all VCSELs (101) or of subgroups of VCSELs (101) of the array superimposes in the working plane (501). The proposed laser device allows the generation of a desired intensity distribution in the working plane without the need of an optics specially designed for this intensity distribution or beam profile.
PCT/IB2010/053687 2009-08-20 2010-08-16 Laser device with configurable intensity distribution WO2011021140A2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP10752427.4A EP2478602B1 (en) 2009-08-20 2010-08-16 Laser device with configurable intensity distribution
KR1020127007045A KR101733422B1 (en) 2009-08-20 2010-08-16 Laser device with configurable intensity distribution
JP2012525239A JP5894529B2 (en) 2009-08-20 2010-08-16 Laser device with brightness distribution that can be changed
US13/391,303 US9048633B2 (en) 2009-08-20 2010-08-16 Laser device with configurable intensity distribution
CN201080036805.1A CN102742100B (en) 2009-08-20 2010-08-16 Laser device with configurable intensity distribution

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP09168289.8 2009-08-20
EP09168289 2009-08-20
EP10162170 2010-05-06
EP10162170.4 2010-05-06

Publications (3)

Publication Number Publication Date
WO2011021140A2 WO2011021140A2 (en) 2011-02-24
WO2011021140A8 WO2011021140A8 (en) 2012-03-08
WO2011021140A3 true WO2011021140A3 (en) 2012-08-16

Family

ID=43048787

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2010/053687 WO2011021140A2 (en) 2009-08-20 2010-08-16 Laser device with configurable intensity distribution

Country Status (6)

Country Link
US (1) US9048633B2 (en)
EP (1) EP2478602B1 (en)
JP (1) JP5894529B2 (en)
KR (1) KR101733422B1 (en)
CN (1) CN102742100B (en)
WO (1) WO2011021140A2 (en)

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