OTHER PUBLICATIONS
Raymond et al., "Metrology of subwavelength photoresist gratings using optical scatterometry," J. Vac. Sci. Technol. B 13(4), Jul./Aug. 1995, pp. 1484-1495.
Wittekoek et al., "In-process Image Detecting Technique for Determination of Overlay, and Image Quality for ASM-L Wafer Stepper," SPIE vol. 1674 Optical/Laser Microlithography V (1992), pp. 594608.
"Algorithm for Line Width Extraction from Cosine Transform," Jun.
1977, IBM Technical Disclosure Bulletin, vol. 20, Issue No. 1, pp.
215-219.
"Chemically Assisted Laser Removal of Photoresist & Particles from
Semi-Wafers" by Genut at el.
"Interferometric Method of Checking the Overlay Accuracy in
Photolifho Graphic Expsure Processes," Mar. 1990, IBM Technical
Disclosure Bulletin, vol. 32, Issue No. 10B, pp. 214-217.
"Narrow Kerf Overlay Test Site," Dec. 1977, IBM Technical Disclo-
sure Bulletin, vol. 20, Issue No. 7, pp. 2664-2666.
Korfh, "Phase-Sensitive Overlay Analysis Spectometry," IBM Tech-
nical Disclosure Bulletin, Mar. 1990, pp. 170-174.
R. Krukar et al.; "Overlay and Grating Line Shape Metrology Using
Optical Scatterometry: Final Report;" Aug. 31, 1993; DARPA.
Raymond et al., "Scatterometry for CD Measurements of Etched
Structures," SPIE vol. 2725, 1996, pp. 720-728.
Sturtevant et al., "Use of Scatterometric Latent Image Detector in
Closed Loop Feedback Control of Linewidth," SPIE vol. 2196,1994,
pp. 352-359.
* cited by examiner
