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Ernsberger

[45] May 22,1979

[54] ELECTROMIGRATION METHOD FOR

MAKING STAINED GLASS PHOTOMASKS

[75] Inventor: Fred M. Ernsberger, Pittsburgh, Pa.

[73] Assignee: PPG Industries, Inc., Pittsburgh, Pa.

[21] Appl. No.: 856,054

[22] Filed: Nov. 30,1977

[51] Int. CI.* C03C 15/00; C03C 17/00

[52] U.S. CI 65/30 E; 65/32;

65/60 R; 65/60 C; 204/130; 427/12; 427/38

[58] Field of Search 65/30 E, 30 R, 60 C,

65/60 R, 32; 204/130; 427/38, 12

[56] References Cited

U.S. PATENT DOCUMENTS

2,314,804 3/1943 Willson 428/210

2.455.719 12/1948 Weyl et al 428/141

2,468,402 4/1949 Kreidl 65/31

2,732,298 1/1956 Stookey 96/34

2,904,432 9/1959 Ross et al 96/34

2,911,749 11/1959 Stookey 428/208

2,927,042 3/1960 Hall et al 427/38

3,370,948 2/1968 Rosenbauer 96/36.2

3,489,624 1/1970 Lake et al 156/15

3,508,982 4/1970 Shearin 156/3

3,510,371 5/1970 Frankson 156/652

3,515,587 6/1970 Letter 428/333

3,528,847 9/1970 Grego et al 65/30 E X

3,542,612 11/1970 Kashau et al 156/13

3,551,304 12/1970 Letter 204/38

3,561,963 2/1971 Kiba 96/34.3

3,573,948 4/1971 Tarnopol 427/96

3,615,318 10/1971 Jagodzinski et al 65/60 C X

3,620,795 11/1971 Kiba 427/343 X

3,622,295 11/1971 Loukes et al 65/30 E

3.650.720 3/1972 Grego et al 65/30 E

3,653,864 4/1972 Rothermel et al 65/30

3,715,244 2/1973 Szupillo 148/31.5

3,720,515 3/1973 Stanley 96/38.4

3,732,792 5/1973 Tarnopol et al 95/1 R

3,754,913 8/1973 Takeuchi et al 96/38.3

3,811,855 5/1974 Carlson et al 65/30

3,816,222 6/1974 Plumat et al 65/30 EX

3,817,730 6/1974 Uchida 65/30 E

3,836,348 9/1974 Sumimoto et al 65/30 E

3,857,689 12/1974 Koizumi et al 65/30

3,879,183 4/1975 Carlson 65/30

3,880,630 4/1975 Izawa 65/30

3,896,016 7/1975 Goodman et al 204/180 R

3,902,882 9/1975 Loukes et al. 65/30

3,905,791 9/1975 Plumat et al. 96/36.2

3,905,818 9/1975 Margrain 96/36.2

3,907,566 9/1975 Inoue et al 96/48 R

3,933,609 1/1976 Bokov 264/180 R

3,960,560 6/1976 Sato 96/36

3,967,040 6/1976 Plumat et al 65/30 E X

3.991.227 11/1976 Carlson et al 427/39

3.991.228 11/1976 Carlson et al 427/39

4,017,291 4/1977 Gliemeruth 65/60 C X

OTHER PUBLICATIONS

Reports, Research Lab., Asahi Glass Company, Ltd., 25-l-(1975), pp. 51-55.

Coloured Glasses, W. A. Weyl, Society of Glass Technology, 1951, pp. 409-419.

Research, 11 (1958), pp. 461-465, "Coloured Patterns In
Glass", A. J. C. Hall, and J. G. Hayes, Annual Review
of Materials Science, 1976, pp. 267-301.
Journal of Applied Physics, vol. 34, No. 6, Jun. 1963,
"Oxygen Outgassing Caused by Electron Bombard-
ment of Glass", J. L. Lineweaver.
Scientific American, Sep. 1977, pp. 111-128, "The Fab-
rication of Microelectronic Circuits", W. G. Oldham.

Primary Examiner—S. Leon Bashore
Assistant Examiner—Frank W. Miga
Attorney, Agent, or Firm—Dennis G. Millman

[57] ABSTRACT

Glass photomasks having a stained pattern within the glass for use in photolithographic processes are made by exposing and developing a photoresist on a sheet of glass and subsequently migrating stain-producing ions, such as silver and/or copper, into the surface of the glass under the influence of an electric field and moderately elevated temperatures.

44 Claims, 28 Drawing Figures

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