A resist solution discharge nozzle for discharging a resist solution to a wafer is moved at a constant speed along a radial direction of the wafer while the wafer is being rotated. During this movement, the amount of the resist solution to be discharged from the resist solution discharge nozzle is gradually...http://www.google.com.au/patents/US6371667?utm_source=gb-gplus-sharePatent US6371667 - Film forming method and film forming apparatus
