A device layer layout methodology, and method and apparatus for patterning a photosensitive layer. Device features are placed on lines running in rows and/or columns during layout. The lines and/or columns are extracted from the database to produce a layout of the phase-edge phase shifting layer. The...http://www.google.com.au/patents/US5635316?utm_source=gb-gplus-sharePatent US5635316 - Layout methodology, mask set, and patterning method for phase-shifting lithography
