A method of fabricating a thin film transistor includes forming an amorphous silicon layer as an active layer on a substrate, forming a gate insulating layer and a gate electrode on the amorphous silicon layer, doping impurities of a first conductive type in the amorphous silicon layer, forming a metal...http://www.google.com.au/patents/US6784034?utm_source=gb-gplus-sharePatent US6784034 - Method for fabricating a thin film transistor
