A conformal, substantially uniform thickness layer of photoresist is deposited on a semiconductor wafer by causing photoresist solids to "sediment" out of solution or suspension. Generally, the more conformal the layer, the more uniform the reflectance of the layer and the less variation in underlying...http://www.google.com.au/patents/US5436463?utm_source=gb-gplus-sharePatent US5436463 - Sedimentary deposition of photoresist on semiconductor wafers
