A substrate processing apparatus has a simple structure in which the number of nozzles is reduced. In a mixer part, photoresist which is supplied from a photoresist supply through a lower arm portion of the nozzle arm is mixed with solvent which is supplied from a solvent supply through a pipe. Following...http://www.google.com.au/patents/US6048400?utm_source=gb-gplus-sharePatent US6048400 - Substrate processing apparatus
