A method for the fluid treatment of semiconductor wafers includes a treatment vessel having opposed first and second ports, and means for holding wafers in a flow path therebetween. A flow segment comprising in sequence, a first vent, a first valve, an inlet, a second valve and a second vent extends...http://www.google.com.au/patents/US4795497?utm_source=gb-gplus-sharePatent US4795497 - Method and system for fluid treatment of semiconductor wafers
