The present invention relates to a process for imaging deep ultraviolet (uv) photoresists with a topcoat using deep uv immersion lithography. The invention further relates to a topcoat composition comprising a polymer with at least one ionizable group having a pKa ranging from about −9 to about 11....http://www.google.com.au/patents/US20050202347?utm_source=gb-gplus-sharePatent US20050202347 - Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof
