In a method of obtaining a crystalline silicon film having high crystallinity at a low temperature and for a short time by using a catalytic element and using both a heat treatment and irradiation of laser light, a catalytic element which does not require a gettering step is used as the catalytic element...http://www.google.com.au/patents/US7226823?utm_source=gb-gplus-sharePatent US7226823 - Semiconductor device and method of manufacturing the same
