A method for forming square shape images in a lithographic process is disclosed wherein a first plurality of lines running in a first direction is defined in a first, usually sacrificial, layer, and then a second resist is defined wherein the lines run in an intersecting pattern to those of the first...http://www.google.com.au/patents/US5959325?utm_source=gb-gplus-sharePatent US5959325 - Method for forming cornered images on a substrate and photomask formed thereby
