Disclosed concepts include a method of, and program product for, optimizing an illumination profile of a pattern to be formed in a surface of a substrate relative to a given mask. Steps include mathematically representing resolvable feature(s) from the given mask, generating an interference map representation...http://www.google.com.au/patents/US7506299?utm_source=gb-gplus-sharePatent US7506299 - Feature optimization using interference mapping lithography
