The present invention provides a low-pressure CVD apparatus capable of forming a film with improved step coverage and which fills up contact holes without forming any seam therein. The low-pressure CVD apparatus comprises a CVD reaction chamber (6) provided with a source gas inlet (5), a susceptor (1)...http://www.google.com.au/patents/US5421888?utm_source=gb-gplus-sharePatent US5421888 - Low pressure CVD apparatus comprising gas distribution collimator
