An exposure mask has a rectangular pattern, an auxiliary pattern, a translucent region, and a shielding region. The rectangular pattern includes a transparent region having a dimension equal to or greater than a critical resolution of exposure light. The auxiliary pattern is arranged around the rectangular...http://www.google.com.au/patents/US7955761?utm_source=gb-gplus-sharePatent US7955761 - Exposure mask, pattern formation method, and exposure mask fabrication method
