A photomask for patterning an integrated circuit device using a patterning radiation may include a transparent substrate, a pattern of radiation blocking regions, an array of radiation blocking regions, and an array of shadowing elements. The transparent substrate may have first and second opposing surfaces,...http://www.google.com.au/patents/US7604927?utm_source=gb-gplus-sharePatent US7604927 - Methods of patterning using photomasks including shadowing elements therein and related systems
