A processing container (610) for providing a flow of a processing fluid during immersion processing of at least one surface of a microelectronic workpiece is set forth. The processing container comprises a principal fluid flow chamber (505) providing a flow of processing fluid to at least one surface...http://www.google.com.au/patents/US6569297?utm_source=gb-gplus-sharePatent US6569297 - Workpiece processor having processing chamber with improved processing fluid flow
