An apparatus and method for removing photoresist from a substrate, which includes treating the photoresist with a first reactant to cause swelling, cracking or delamination of the photoresist, treating the photoresist with a second reactant to chemically alter the photoresist, and subsequently removing...http://www.google.com.au/patents/US7431855?utm_source=gb-gplus-sharePatent US7431855 - Apparatus and method for removing photoresist from a substrate
