A showerhead adapted for distributing gases into a process chamber and a method for forming dielectric layers on a substrate are generally provided. In one embodiment, a showerhead for distributing gases in a processing chamber includes an annular body coupled between a disk and a mounting flange. The...http://www.google.com.au/patents/US20030207033?utm_source=gb-gplus-sharePatent US20030207033 - Method and apparatus for deposition of low dielectric constant materials
