Processes are provided for producing bismuth-containing oxide thin films by atomic layer deposition. In preferred embodiments an organic bismuth compound having at least one monodentate alkoxide ligand is used as a bismuth source material. Bismuth-containing oxide thin films can be used, for example,...http://www.google.com.au/patents/US7713584?utm_source=gb-gplus-sharePatent US7713584 - Process for producing oxide films
