A method and system for correcting optical aberrations in a maskless lithography system. Adjusters move individual spatial light modulators (SLMs) in an SLM array so that the surface of the SLM array deviates from a flat plane. The deviation compensates for aberrations in the lithography system, such...http://www.google.com.au/patents/US7414701?utm_source=gb-gplus-sharePatent US7414701 - Method and systems for total focus deviation adjustments on maskless lithography systems
