An exposure mask capable of improving resolution is provided. An exposure mask includes one slit-shaped main transmission region and three pairs of slit-shaped auxiliary transmission regions arranged in order in a direction perpendicular to the longitudinal direction of the main transmission region,...http://www.google.com.au/patents/US7604910?utm_source=gb-gplus-sharePatent US7604910 - Exposure mask, method of forming resist pattern and method of forming thin film pattern
