Chemical vapor deposition reactions are carried out by introducing first and second precursors for the material to be deposited into a reaction chamber (5) along a plurality of separate discrete paths (21,24) where they are cooled prior to entry into the reaction chamber. The precursors are mixed in...http://www.google.com.au/patents/US5871586?utm_source=gb-gplus-sharePatent US5871586 - Chemical vapor deposition
