A mask and method of manufacturing a poly-silicon layer using the same are provided. The mask has a first, a second, a third, and a fourth region. The first region has first opaque portions and first slits. The second region has second slits and second opaque portions. The third region includes third...http://www.google.com.au/patents/US7473498?utm_source=gb-gplus-sharePatent US7473498 - Mask and method of manufacturing a poly-silicon layer using the same
