A method of processing a substrate, comprising forming a chemically amplified resist film on a substrate, irradiating energy beams to the chemically amplified resist film to form a latent image therein, carrying out heat treatment with respect to the chemically amplified resist film, heating treatment...http://www.google.com.au/patents/US7009148?utm_source=gb-gplus-sharePatent US7009148 - Method of processing a substrate, heating apparatus, and method of forming a pattern
