A plasma etching apparatus capable of performing processing with excellent in-plane uniformity on an object to be processed having a large diameter is provided. The present invention provides a plasma etching apparatus including a processing chamber 13 which performs plasma processing on an object to...http://www.google.com.au/patents/US20090223633?utm_source=gb-gplus-sharePatent US20090223633 - Apparatus And Method For Plasma Etching
