Methods and apparatuses for analyzing and controlling performance parameters in planarization of microelectronic substrates. In one embodiment, a planarizing machine for mechanical or chemical-mechanical planarization includes a table, a planarizing pad on the table, a carrier assembly, and an array...http://www.google.com.au/patents/US7182668?utm_source=gb-gplus-sharePatent US7182668 - Methods for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates
