Cleaning compounds, apparatus, and methods to remove contaminants from a substrate surface are provided. An exemplary cleaning compound to remove particulate contaminants from a semiconductor substrate surface is provided. The cleaning compound includes a viscous liquid with a viscosity between about...http://www.google.com.au/patents/US7799141?utm_source=gb-gplus-sharePatent US7799141 - Method and system for using a two-phases substrate cleaning compound
