A dielectric layer containing a hafnium tantalum oxide film and a method of fabricating such a dielectric layer produce a dielectric layer for use in a variety of electronic devices. Embodiments include structures for capacitors, transistors, memory devices, and electronic systems with dielectric layers...http://www.google.com.au/patents/US7602030?utm_source=gb-gplus-sharePatent US7602030 - Hafnium tantalum oxide dielectrics
