An image sensor manufacturing method, in which a chromium layer or the tantalum layer as barrier metal is formed on the semiconductor layer as the ohmic contact layer of the thin film transistor switching element (TFT). With use of the chromium layer or the tantalum layer, the semiconductor layers of...http://www.google.com.au/patents/US5075244?utm_source=gb-gplus-sharePatent US5075244 - Method of manufacturing image sensors
