A method for depositing a film on a substrate using a plasma enhanced atomic layer deposition (PEALD) process includes disposing the substrate in a process chamber configured to facilitate the PEALD process, wherein the process chamber includes a substrate zone proximate the substrate and a peripheral...http://www.google.com.au/patents/US7341959?utm_source=gb-gplus-sharePatent US7341959 - Plasma enhanced atomic layer deposition system and method
