A process for forming a thick-film resistor whose dimensions can be accurately obtained, thereby yielding a precise resistance value. The method includes providing on a substrate a photoimageable layer that preferably forms a permanent dielectric layer of a multilayer structure. An opening is photodefined...http://www.google.com.au/patents/US6229098?utm_source=gb-gplus-sharePatent US6229098 - Method for forming a thick-film resistor and thick-film resistor formed thereby
