An apparatus used to supply a force onto a cleaning solution for processing a substrate for cleaning surface contaminants is disclosed. The apparatus includes a force applicator and a gate. The force applicator is configured to be adjusted to a first height off the surface of the substrate. The gate...http://www.google.com.au/patents/US7913703?utm_source=gb-gplus-sharePatent US7913703 - Method and apparatus for uniformly applying a multi-phase cleaning solution to a substrate
