The relative photoemission threshold properties of conductive materials are used as a basis for selectively etching conductive materials in the presence of other conductive materials. An irradiation beam of pre-selected wavelength is used to generate photoemitted electrons locally which in turn create...http://www.google.com.au/patents/US5129991?utm_source=gb-gplus-sharePatent US5129991 - Photoelectron-induced selective etch process
