Apparatus and method for abatement of effluent from multi-component metal oxides deposited by CVD processes using metal source reagent liquid solutions which comprise at least one metal coordination complex including a metal to which is coordinatively bound at least one ligand in a stable complex and...http://www.google.com.au/patents/US6833024?utm_source=gb-gplus-sharePatent US6833024 - Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions
