It is an object of the present invention to provide a cleaning method of and a cleaning apparatus for removing organic matters such as phthalates that have deposited on the surface of a semiconductor substrate while restraining the growth of a natural oxide film. The present invention provides a method...http://www.google.com.au/patents/US20020023670?utm_source=gb-gplus-sharePatent US20020023670 - Method of and apparatus for cleaning semiconductor device
