Additional variants of the method of etching structures into an etching body, in particular recesses in a silicon body that are laterally defined in a precise manner by an etching mask, using a plasma, is described. In addition, the use of this method in the introduction of structures, in particular...http://www.google.com.au/patents/US20040124177?utm_source=gb-gplus-sharePatent US20040124177 - Method of etching structures into an etching body using a plasma
