A germanium and silicon alloy is employed as an antireflective coating material for use in active area lithography and gate area lithography steps in the formation of a semiconductor integrated circuit. A layer composed of an alloy of germanium-silicon is deposited over an active area nitride layer or...http://www.google.com.au/patents/US6114255?utm_source=gb-gplus-sharePatent US6114255 - Method of using an alloy of germanium and silicon as an antireflective coating
