A plasma processing method includes providing a substrate in a processing chamber, the substrate having a surface, and generating a plasma in the processing chamber. The plasma provides at least two regions that exhibit different plasma densities. The method includes exposing at least some of the surface...http://www.google.com.au/patents/US7402526?utm_source=gb-gplus-sharePatent US7402526 - Plasma processing, deposition, and ALD methods
