Metal chalcogenide films comprising at least one transition metal chalcogenide are prepared by dissolving a metal chalcogenide containing at least one transition metal chalcogenide in a hydrazine compound and, optionally, an excess of chalcogen to provide a precursor of the metal chalcogenide; applying...http://www.google.com.au/patents/US7341917?utm_source=gb-gplus-sharePatent US7341917 - Solution deposition of chalcogenide films containing transition metals
