A combination metrology tool is disclosed which is capable of obtaining both thermal wave and optical spectroscopy measurements on a semiconductor wafer. In a preferred embodiment, the principal combination includes a thermal wave measurement and a spectroscopic ellipsometric measurement. These measurements...http://www.google.com.au/patents/US6671047?utm_source=gb-gplus-sharePatent US6671047 - Combination thermal wave and optical spectroscopy measurement systems
