A polishing pad for CMP is rapidly preconditioned before actual use by impinging a stream of particles on the polishing surface. Embodiments of the present invention include linearly traversing an impinging jet stream of unagglomerated ceramic particles, e.g., silicon dioxide particles having a particle...http://www.google.com.au/patents/US6300247?utm_source=gb-gplus-sharePatent US6300247 - Preconditioning polishing pads for chemical-mechanical polishing
