An antireflection film includes a base resin and an additive resin, the additive resin having a dry etching rate higher than that of the base resin. A photoresist pattern is formed and the antireflection film is selectively etched using the photoresist pattern as a mask. The molecular weight and weight...http://www.google.com.au/patents/US6090523?utm_source=gb-gplus-sharePatent US6090523 - Multi-resin material for an antireflection film to be formed on a workpiece disposed on a semiconductor substrate
