A method and apparatus for atomic layer deposition (ALD) is described. The apparatus comprises a deposition chamber and a wafer support. The deposition chamber is divided into two or more deposition regions that are integrally connected one to another. The wafer support is movable between the two or...http://www.google.com.au/patents/US7660644?utm_source=gb-gplus-sharePatent US7660644 - Atomic layer deposition apparatus
