The present invention provides a method for cleaning a processing chamber. According to a specific embodiment, the method includes steps of depositing a dielectric film on a wafer on a ceramic heater in the processing chamber in a first time period, with the ceramic heater heated to...http://www.google.com.au/patents/US5812403?utm_source=gb-gplus-sharePatent US5812403 - Methods and apparatus for cleaning surfaces in a substrate processing system 
