A substrate (W) is held and rotated in its horizontal position on a spin base (10). A processing liquid can be supplied from a processing liquid lower nozzle 15 to the lower surface of the substrate (W). The upper surface of the substrate (W) is covered with an atmosphere blocking plate (30). A splash...http://www.google.com.au/patents/US7584760?utm_source=gb-gplus-sharePatent US7584760 - Substrate processing apparatus
