A multi-electrode plasma processing system (10) provides flexible plasma processing capabilities for semiconductor device fabrication. The plasma processing equipment (10) includes a gas showerhead assembly (52) a radio-frequency chuck (24), and screen electrode (66). The screen electrode (66) includes...http://www.google.com.au/patents/US5464499?utm_source=gb-gplus-sharePatent US5464499 - Multi-electrode plasma processing apparatus
