A coating apparatus has a spin chuck for attracting and holding a semiconductor wafer in a horizontal state by means of vacuum. A movable beam is arranged above the spin chuck. The movable beam includes first and second nozzles integrally formed. The first nozzle is used for supplying a photo-resist...http://www.google.com.au/patents/US5919520?utm_source=gb-gplus-sharePatent US5919520 - Coating method and apparatus for semiconductor process
