An apparatus for delivering a fluidic media to a wafer includes a housing defining a process chamber. A fluidic media delivery member is coupled to the process chamber. A rotatable chuck is positioned in the process chamber. The rotatable chuck has a wafer support surface coated with a coating material....http://www.google.com.au/patents/US6955720?utm_source=gb-gplus-sharePatent US6955720 - Plasma deposition of spin chucks to reduce contamination of Silicon wafers
