A developing apparatus for developing a photoresist-coated substrate comprises a spin chuck having a supporting surface smaller in size than the substrate and adapted to be spin-driven with the photoresist-coated substrate surface held upward, a cup surrounding the spin chuck, a developing...http://www.google.com.au/patents/US5689749?utm_source=gb-gplus-sharePatent US5689749 - Apparatus for developing a resist-coated substrate
